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PE-ALD法による、SiO2, Al2O3 ,そしてTiO2基板上でのRuO2膜の成長
(Growth of RuO2 films on SiO2, Al2O3 and TiO2 layers by plasma-enhanced ALD)
ALD2015 15th International Conference on Atomic Layer Deposition. 2015.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 10:58:15 +0900Updated at: 2017-07-10 22:06:34 +0900