HOME > Presentation > DetailScalable growth of atomically-thin MoS2 layers in conventional MOCVD system using molybdenum oxychloride as the molybdenum sourceYANG, Xu, LI, Shisheng, OHTAKE, Akihiro, SAKUMA, Yoshiki. ICCGE-20. July 30, 2023-August 04, 2023.NIMS author(s)OHTAKE, AkihiroSAKUMA, YoshikiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2023-09-06 04:00:05 +0900 Updated at: 2023-09-06 04:00:05 +0900