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GaN/HfSiOxキャパシタの電気特性に対するHfSiOx絶縁膜の膜厚依存性
(Thickness dependence of HfSiOx insulator on electrical properties of GaN/HfSiOx capacitor)
第25回電子デバイス界面テクノロジー研究会. January 30, 2020-February 01, 2020.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2020-03-07 03:00:25 +0900 Updated at: 2020-03-07 03:00:25 +0900