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アモルファス酸化インジウム薄膜トランジスタにおける電荷密度および移動度の添加元素依存性
(Dopant selection for control of charge carrier density and mobility in amorphous indium oxide based thin-film transistors)

応用物理学会春季学術講演会. March 11, 2015-March 14, 2015.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-02-14 10:56:43 +0900Updated at: 2017-07-10 22:05:52 +0900

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