Correlative TEM/APT/CL analyses on the effect of ultra-high-pressure annealing for Mg-implanted p-type GaN

UZUHASHI, Jun, CHEN, Jun, Ryo Tanaka, Shinya Takashima, Kacper Sierakowski, Michal Bockowski, Tetsu Kachi, Masaharu Edo, Takashi Sekiguchi, OHKUBO, Tadakatsu.

12th International Workshop on Nitride Semiconductors (IWN2024). 2024年11月03日-2024年11月08日.