Correlative TEM/APT/CL analyses on the effect of ultra-high-pressure annealing for Mg-implanted p-type GaN

UZUHASHI, Jun, CHEN, Jun, Ryo Tanaka, Shinya Takashima, Kacper Sierakowski, Michal Bockowski, Tetsu Kachi, Masaharu Edo, Takashi Sekiguchi, OHKUBO, Tadakatsu.

12th International Workshop on Nitride Semiconductors (IWN2024). November 03, 2024-November 08, 2024.