HOME > Presentation > DetailCrystallization of n-type Si0.1Ge0.9 thin films by high-speed CW laser annealing(高速 CW レーザアニル によ る n型 Si0.1Ge0.9薄膜の結晶成長)SAPUTRO, Rahmat Hadi, MATSUMURA, Ryo, 前田辰郎, FUKATA, Naoki. 第84回応用物理学会秋季学術講演会. September 19, 2023-September 23, 2023.NIMS author(s)MATSUMURA, RyoFUKATA, NaokiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2024-01-09 03:11:16 +0900 Updated at: 2024-01-09 03:11:16 +0900