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Study of ALD HfO2-based high-k for GaN power devices and Ferroelectric devices
20th International conference on Atomic Layer Deposition (ALD/ALE 2020). June 28, 2020-July 01, 2020. Invited
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2020-07-07 03:00:22 +0900 Updated at: 2024-03-05 12:21:28 +0900