HOME > 口頭発表 > 書誌詳細High temperature in situ AFM/STM observation of decomposition and cleaning process of ultrathin SiO2 films on Si(111) surfaces iFUJITA, Daisuke, KUMAKURA, Tsuyako, ONISHI, Keiko, SAGISAKA, Keisuke. 18th International Vacuum Congress. 2010.NIMS著者藤田 大介大西 桂子鷺坂 恵介Materials Data Repository (MDR)上の本文・データセット作成時刻 :2017-01-08 04:31:29 +0900 更新時刻 :2017-07-10 20:52:56 +0900