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High temperature in situ AFM/STM observation of decomposition and cleaning process of ultrathin SiO2 films on Si(111) surfaces i
18th International Vacuum Congress. 2010.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:31:29 +0900Updated at: 2017-07-10 20:52:56 +0900