HOME > Presentation > Detail
Siナノ細線への熱酸化応力誘起とフォノン閉じ込め効果
(Introduction of stress and phonon confinement in thermally oxidized silicon nanowires)
第127回結晶工学分科会研究会「IV族系半導体のひずみエンジニアリン. 2007. Invited
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 05:36:43 +0900Updated at: 2024-03-05 11:41:26 +0900