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Characteristics of GaN/HfSiOx interface for n-GaN/HfSiOx/Pt MOS capacitor

MAEDA, Erika, NABATAME, Toshihide, HIROSE, Masafumi, INOUE, Mari, OHI, Akihiko, 塩崎宏司, 清野肇, IKEDA, Naoki.
International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS (THERMEC'2021). 2021.

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Materials Data Repository (MDR)上の本文・データセット

    作成時刻: 2021-06-09 03:00:17 +0900更新時刻: 2021-06-09 03:00:17 +0900

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