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ダイレクト式大気圧プラズマCVD法によるGaN薄膜成長
(Fabrication of GaN films by Direct Type Near-Atmospheric Plasma-Assisted Chemical Vapor Deposition)
2006年秋季 第67回応用物理学会学術講演会. August 29, 2006-September 01, 2006.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:17:40 +0900 Updated at: 2017-07-10 19:42:28 +0900