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Comparison of Reliability of Ferroelectric HfxZr1−xO2 Thin Films Fabricated by Several Processes with Plasma-Enhanced and Thermal Atomic Layer Deposition
The 19th Annual Non-Volatile Memory Technology Symposium. October 28, 2019-October 30, 2019.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2019-12-25 03:00:21 +0900Updated at: 2019-12-25 03:00:21 +0900