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NIMS Award Symposium 2026

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HfxZr1−xO2/ZrO2積層構造による強誘電体厚膜の強誘電性の向上
(Improvement of ferroelectricity of thick ferroelectric films using HfxZr1−xO2/ZrO2 stack structure)

女屋 崇, 生田目 俊秀, 井上 万里, Yong Chan Jung, Heber Hernandez-Arriaga, Jaidah Mohan, Harrison S. Kim, 澤本 直美, 長田 貴弘, Jiyoung Kim, 小椋 厚志.
第81回応用物理学会秋季学術講演会. September 08, 2020-September 11, 2020.

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