HOME > Presentation > DetailStudy on interface structure of CeF3/Ge stack structure by hard x-ray photoelectron spectroscopy長田 貴弘, 上田 茂典, 松田 朝彦, 山下 良之, 知京 豊裕. 7th International Conference on Hard X-Ray Photoelectron Spectro. 2017.NIMS author(s)NAGATA, TakahiroUEDA, ShigenoriMATSUDA, AsahikoYAMASHITA, YoshiyukiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2017-07-20 22:31:47 +0900 Updated at :2018-06-05 14:10:51 +0900