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X線発光および硬X線光電子分光による金属/High-k、酸化膜/Si界面電子状態の観測
(Electronic States of Metal-gate/High-K and oxide/Si interfaces obtained from X-ray emission and hard X-ray photoelectron spectroscopy)
The 5th NIMS-MPI Work Shop. 2007.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:06:49 +0900Updated at: 2017-07-10 20:01:45 +0900