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Direct observation of bias-dependence potential distribution in metal/HfO2 gate stack structures by operando hard x-ray photoelectron spectroscopy
The 8th International Symposium on Surface Science. 2017.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-11-10 22:40:16 +0900Updated at: 2018-06-05 14:14:48 +0900