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Growth mechanism and characteristics of Hf-Si-O film by PE-ALD using TDMAS and TDMAH precursors and oxygen plasma gas
AVS 65th International symposium & Exhibition. October 21, 2018-October 26, 2018.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2018-05-09 22:11:41 +0900 Updated at: 2018-06-05 14:20:13 +0900