Ferroelectricity of Ferroelectric HfxZr1−xO2/Antiferroelectric ZrO2 Stack Structure Fabricated by Atomic Layer Deposition

ONAYA, Takashi, NABATAME, Toshihide, Y. C. Jung, H. Hernandez-Arriaga, J. Mohan, H. S. Kim, A. Khosravi, 澤本直美, NAGATA, Takahiro, R. M. Wallace, J. Kim, 小椋厚志.

20th International Conference on Atomic Layer Deposition. June 29, 2020-July 01, 2020.

Created at: 2020-11-30 14:06:47 +0900 Updated at: 2020-11-30 14:06:47 +0900