Y2O3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma | SAMURAI, NIMS Researchers Directory Service

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Y2O3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma
(二段階プロセスで作製したY2O3薄膜とそのハロゲンプラズマ耐性)

ISHII, Masashi, IKEDA, Naoki, TSUYA, Daiju, SAKURAI, Kenji.

Proceedings of 2008 E-MRS 205-212. 2009.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2022-09-05 12:09:45 +0900Updated at: 2022-09-05 12:09:45 +0900

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