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Metal–insulator transition of valence-controlled VO2thin film prepared by RF magnetron sputtering using oxygen radical

著者Takaaki Suetsugu, Yuichi Shimazu, Takashi Tsuchiya, Masaki Kobayashi, Makoto Minohara, Enju Sakai, Koji Horiba, Hiroshi Kumigashira, Tohru Higuchi.
掲載誌名Japanese Journal of Applied Physics 55 [6S1] 06GJ11
ISSN: 13474065, 00214922
ESIでのカテゴリ: PHYSICS
出版社Japan Society of Applied Physics
発表年2016
言語English
DOIhttps://doi.org/10.7567/jjap.55.06gj11
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