Takaaki Suetsugu; Yuichi Shimazu; Takashi Tsuchiya; Masaki Kobayashi; Makoto Minohara; Enju Sakai; Koji Horiba; Hiroshi Kumigashira; Tohru Higuchi

doi:10.7567/jjap.55.06gj11

Metal–insulator transition of valence-controlled VO2thin film prepared by RF magnetron sputtering using oxygen radical

著者	Takaaki Suetsugu, Yuichi Shimazu, Takashi Tsuchiya, Masaki Kobayashi, Makoto Minohara, Enju Sakai, Koji Horiba, Hiroshi Kumigashira, Tohru Higuchi.
掲載誌名	Japanese Journal of Applied Physics 55 [6S1] 06GJ11 ISSN: 13474065, 00214922 ESIでのカテゴリ: PHYSICS
出版社	Japan Society of Applied Physics
発表年	2016
言語	English
DOI	https://doi.org/10.7567/jjap.55.06gj11
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