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Reducing the Impact of Bulk Doping on Transport Properties of Bi‐Based 3D Topological Insulators

著者Shaham Jafarpisheh, An Ju, Kevin Janßen, Takashi Taniguchi, Kenji Watanabe, Christoph Stampfer, Bernd Beschoten.
掲載誌名physica status solidi (b) 258 [1] 2000021
出版社Wiley
発表年2021
言語English
DOIhttps://doi.org/10.1002/pssb.202000021
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