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Reducing the Impact of Bulk Doping on Transport Properties of Bi‐Based 3D Topological Insulators

Author(s)Shaham Jafarpisheh, An Ju, Kevin Janßen, Takashi Taniguchi, Kenji Watanabe, Christoph Stampfer, Bernd Beschoten.
Journal titlephysica status solidi (b) 258 [1] 2000021
PublisherWiley
Year of publication2021
LanguageEnglish
DOIhttps://doi.org/10.1002/pssb.202000021
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