HOME > 論文 > 書誌詳細Analysis of indium diffusion profiles based on the Fermi-level effect in single-crystal zinc oxideTsubasa Nakagawa, Kenji Matsumoto, Isao Sakaguchi, Masashi Uematsu, Hajime Haneda, Naoki Ohashi. Japanese Journal of Applied Physics 47 [10] 7848-7850. 2008.https://doi.org/10.1143/jjap.47.7848 NIMS著者坂口 勲羽田 肇大橋 直樹Materials Data Repository (MDR)上の本文・データセット作成時刻 :2016-05-24 15:36:57 +0900 更新時刻 :2020-11-16 23:07:23 +0900