Electrical and structural properties of TiO2−δthin film with oxygen vacancies prepared by RF magnetron sputtering using oxygen radical | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Electrical and structural properties of TiO2−δthin film with oxygen vacancies prepared by RF magnetron sputtering using oxygen radical
(酸素ラジカルRFスパッタで成膜したTiO2－δ薄膜の電子構造)

Kinya Kawamura, Naoya Suzuki, Takashi Tsuchiya, Yuichi Shimazu, Makoto Minohara, Masaki Kobayashi, Koji Horiba, Hiroshi Kumigashira, Tohru Higuchi.

Japanese Journal of Applied Physics 55 [6S1] 06GJ08. 2016.

https://doi.org/10.7567/jjap.55.06gj08

NIMS著者

土屋敬志

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-10-26 15:43:40 +0900更新時刻: 2024-04-01 23:59:37 +0900

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