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Electrical and structural properties of TiO2−δthin film with oxygen vacancies prepared by RF magnetron sputtering using oxygen radical
(酸素ラジカルRFスパッタで成膜したTiO2-δ薄膜の電子構造)

Kinya Kawamura, Naoya Suzuki, Takashi Tsuchiya, Yuichi Shimazu, Makoto Minohara, Masaki Kobayashi, Koji Horiba, Hiroshi Kumigashira, Tohru Higuchi.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2016-10-26 15:43:40 +0900 Updated at :2020-11-16 22:52:14 +0900

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