HOME > Article > DetailElectrical and structural properties of TiO2−δthin film with oxygen vacancies prepared by RF magnetron sputtering using oxygen radical(酸素ラジカルRFスパッタで成膜したTiO2-δ薄膜の電子構造)Kinya Kawamura, Naoya Suzuki, Takashi Tsuchiya, Yuichi Shimazu, Makoto Minohara, Masaki Kobayashi, Koji Horiba, Hiroshi Kumigashira, Tohru Higuchi. Japanese Journal of Applied Physics 55 [6S1] 06GJ08. 2016.https://doi.org/10.7567/jjap.55.06gj08 NIMS author(s)TSUCHIYA, TakashiFulltext and dataset(s) on Materials Data Repository (MDR)Created at :2016-10-26 15:43:40 +0900 Updated at :2020-11-16 22:52:14 +0900