Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H2 plasma used for nanocrysta | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H2 plasma used for nanocrysta
(ナノクリスタルダイヤモンド合成用CH4/H2低圧誘導結合プラズマのイオンエネルギー分布とCH3ラジカル密度)

Katsuyuki Okada, Shojiro Komatsu, Seiichiro Matsumoto.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 [6] 1988-1992. 2003.

https://doi.org/10.1116/1.1621404

NIMS著者

岡田勝行

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 11:58:44 +0900更新時刻: 2024-05-02 04:50:54 +0900

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