Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H2 plasma used for nanocrysta | SAMURAI, NIMS Researchers Directory Service

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Ion energy distributions and the density of CH3 radicals in a low pressure inductively coupled CH4/H2 plasma used for nanocrysta
(ナノクリスタルダイヤモンド合成用CH4/H2低圧誘導結合プラズマのイオンエネルギー分布とCH3ラジカル密度)

Katsuyuki Okada, Shojiro Komatsu, Seiichiro Matsumoto.

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 [6] 1988-1992. 2003.

https://doi.org/10.1116/1.1621404

NIMS author(s)

OKADA, Katsuyuki

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 11:58:44 +0900 Updated at: 2026-09-30 04:44:10 +0900

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