Thermal‐Budget‐Decoupled Integration of Freestanding Hafnium‐Based Ferroelectric Dielectrics for van der Waals Memory Transistors

Song Zhao; Ming‐Chun Zheng; Feng‐Shou Yang; Che‐Yi Lin; Bo‐Cia Chen; Rahul; Kenji Watanabe; Takashi Taniguchi; Yen‐Lin Huang; Chang‐Hong Shen; Yu‐Lun Chueh; Po‐Wen Chiu; Jiunn‐Lin Wu; Jan‐Chi Yang; Mengjiao Li; Yen‐Fu Lin; Song Zhao; Ming‐Chun Zheng; Feng‐Shou Yang; Che‐Yi Lin; Bo‐Cia Chen; Rahul; Kenji Watanabe; Takashi Taniguchi; Yen‐Lin Huang; Chang‐Hong Shen; Yu‐Lun Chueh; Po‐Wen Chiu; Jiunn‐Lin Wu; Jan‐Chi Yang; Mengjiao Li; Yen‐Fu Lin

doi:10.1002/adma.74847

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Thermal‐Budget‐Decoupled Integration of Freestanding Hafnium‐Based Ferroelectric Dielectrics for van der Waals Memory Transistors

Song Zhao, Ming‐Chun Zheng, Feng‐Shou Yang, Che‐Yi Lin, Bo‐Cia Chen, Rahul, Kenji Watanabe, Takashi Taniguchi, Yen‐Lin Huang, Chang‐Hong Shen, Yu‐Lun Chueh, Po‐Wen Chiu, Jiunn‐Lin Wu, Jan‐Chi Yang, Mengjiao Li, Yen‐Fu Lin.

ADVANCED MATERIALS 38 [59] e74847-1-e74847-12. 2026.

https://doi.org/10.1002/adma.74847

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Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2026-11-05 03:06:01 +0900 更新時刻: 2026-11-05 03:06:01 +0900