Carbon-Doped Silicon Oxide  Films with Hydrocarbon Netework Bonds for Low-k Dielectrics: Theoretical Investigations

Nobuo Tajima; Takahisa Ohno; Tomoyuki Hamada; Katsumi Yoneda; Seiichi Kondo; Nobuyoshi Kobayashi; Manabu Shinriki; Yoshiaki Inaishi; Kazuhiro Miyazawa; Kaoru Sakota; Satoshi Hasaka; Minoru Inoue; Nobuo Tajima; Takahisa Ohno; Tomoyuki Hamada; Katsumi Yoneda; Seiichi Kondo; Nobuyoshi Kobayashi; Manabu Shinriki; Yoshiaki Inaishi; Kazuhiro Miyazawa; Kaoru Sakota; Satoshi Hasaka; Minoru Inoue

doi:10.1143/jjap.46.5970

Carbon-Doped Silicon Oxide Films with Hydrocarbon Netework Bonds for Low-k Dielectrics: Theoretical Investigations
(低誘電率材料のための炭化水素ネットワーク結合を有する炭化水素ドープ酸化ケイ素膜－理論的研究)

Nobuo Tajima, Takahisa Ohno, Tomoyuki Hamada, Katsumi Yoneda, Seiichi Kondo, Nobuyoshi Kobayashi, Manabu Shinriki, Yoshiaki Inaishi, Kazuhiro Miyazawa, Kaoru Sakota, Satoshi Hasaka, Minoru Inoue.

Japanese Journal of Applied Physics 46 [9A] 5970-5974. 2007.

https://doi.org/10.1143/jjap.46.5970

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 15:18:56 +0900Updated at: 2024-03-30 02:08:23 +0900

Carbon-Doped Silicon Oxide Films with Hydrocarbon Netework Bonds for Low-k Dielectrics: Theoretical Investigations(低誘電率材料のための炭化水素ネットワーク結合を有する炭化水素ドープ酸化ケイ素膜－理論的研究)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Carbon-Doped Silicon Oxide Films with Hydrocarbon Netework Bonds for Low-k Dielectrics: Theoretical Investigations
(低誘電率材料のための炭化水素ネットワーク結合を有する炭化水素ドープ酸化ケイ素膜－理論的研究)