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Evolution of Quaterrylene Thin Films on a Silicon Dioxide Surface Using an Ultraslow Deposition Technique

著者Ryoma Hayakawa, Matthieu Petit, Yutaka Wakayama, Toyohiro Chikyow.
掲載誌名The Journal of Physical Chemistry C 111 [50] 18703-18707
ISSN: 19327447
ESIでのカテゴリ: CHEMISTRY
出版社American Chemical Society (ACS)
発表年2007
言語English
DOIhttps://doi.org/10.1021/jp076308v
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