Ryoma Hayakawa; Matthieu Petit; Yutaka Wakayama; Toyohiro Chikyow

doi:10.1021/jp076308v

Evolution of Quaterrylene Thin Films on a Silicon Dioxide Surface Using an Ultraslow Deposition Technique

著者	Ryoma Hayakawa, Matthieu Petit, Yutaka Wakayama, Toyohiro Chikyow.
掲載誌名	The Journal of Physical Chemistry C 111 [50] 18703-18707 ISSN: 19327447 ESIでのカテゴリ: CHEMISTRY
出版社	American Chemical Society (ACS)
発表年	2007
言語	English
DOI	https://doi.org/10.1021/jp076308v
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