Evolution of Quaterrylene Thin Films on a Silicon Dioxide Surface Using an Ultra-Slow Deposition Technique
(超低速分子蒸着法を用いて形成したクォテリレン薄膜のシリコン酸化膜上における成長過程)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 15:25:27 +0900Updated at: 2024-04-01 19:51:55 +0900