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Anisotropic etching of graphite and graphene in a remote hydrogen plasma
(Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma)

D. Hug, S. Zihlmann, M. K. Rehmann, Y. B. Kalyoncu, T. N. Camenzind, L. Marot, K. Watanabe, T. Taniguchi, D. M. Zumbühl.
npj 2D Materials and Applications 1 [1] 21. 2017.
https://doi.org/10.1038/s41699-017-0021-7
Open Access Springer Nature (Publisher)

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    作成時刻: 2017-09-04 22:03:10 +0900更新時刻: 2024-03-30 01:30:17 +0900

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