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Anisotropic etching of graphite and graphene in a remote hydrogen plasma
(Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma)

著者D. Hug, S. Zihlmann, M. K. Rehmann, Y. B. Kalyoncu, T. N. Camenzind, L. Marot, K. Watanabe, T. Taniguchi, D. M. Zumbühl.
掲載誌名npj 2D Materials and Applications 1 [1] 21
ISSN: 23977132
出版社Springer Nature
発表年2017
言語English
DOIhttps://doi.org/10.1038/s41699-017-0021-7
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