SAMURAI - NIMS Researchers Database

HOME > Article > Detail

Anisotropic etching of graphite and graphene in a remote hydrogen plasma
(Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma)

D. Hug, S. Zihlmann, M. K. Rehmann, Y. B. Kalyoncu, T. N. Camenzind, L. Marot, K. Watanabe, T. Taniguchi, D. M. Zumbühl.
npj 2D Materials and Applications 1 [1] 21. 2017.
https://doi.org/10.1038/s41699-017-0021-7
Open Access Springer Nature (Publisher)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2017-09-04 22:03:10 +0900Updated at: 2024-03-30 01:30:17 +0900

    ▲ Go to the top of this page