SAMURAI - NIMS Researchers Database

HOME > 論文 > 詳細

Stress Release Drives Growth Transition of Quaterrylene Thin Films on SiO2 Surfaces

著者Ryoma Hayakawa, XueNa Zhang, Helmut Dosch, Nobuya Hiroshiba, Toyohiro Chikyow, Yutaka Wakayama.
掲載誌名The Journal of Physical Chemistry C 113 [6] 2197-2199
ISSN: 19327447
ESIでのカテゴリ: CHEMISTRY
出版社American Chemical Society (ACS)
発表年2009
言語English
DOIhttps://doi.org/10.1021/jp809556p
この文献をMendeleyにインポートMendeley

▲ページトップへ移動