HOME > 論文 > 書誌詳細Stress Release Drives Growth Transition of Quaterrylene Thin films on SiO2 SurfacesRyoma Hayakawa, XueNa Zhang, Helmut Dosch, Nobuya Hiroshiba, Toyohiro Chikyow, Yutaka Wakayama. The Journal of Physical Chemistry C 113 [6] 2197-2199. 2009.https://doi.org/10.1021/jp809556p NIMS著者早川 竜馬知京 豊裕若山 裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 15:42:09 +0900 更新時刻: 2026-08-30 04:37:06 +0900
