HOME > Article > DetailStress Release Drives Growth Transition of Quaterrylene Thin films on SiO2 SurfacesRyoma Hayakawa, XueNa Zhang, Helmut Dosch, Nobuya Hiroshiba, Toyohiro Chikyow, Yutaka Wakayama. The Journal of Physical Chemistry C 113 [6] 2197-2199. 2009.https://doi.org/10.1021/jp809556p NIMS author(s)HAYAKAWA, RyomaCHIKYO, ToyohiroWAKAYAMA, YutakaFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 15:42:09 +0900Updated at: 2024-04-01 19:46:25 +0900