HOME > Article > DetailSelf-aligned and self-limiting van der Waals epitaxy of monolayer MoS2 for scalable 2D electronicsYoshiki Sakuma, Keisuke Atsumi, Takanobu Hiroto, Jun Nara, Akihiro Ohtake, Yuki Ono, Takashi Matsumoto, Yukihiro Muta, Kai Takeda, Emi Kano, Toshiki Yasuno, Xu Yang, Nobuyuki Ikarashi, Asato Suzuki, Michio Ikezawa, Shuhong Li, Tomonori Nishimura, Kaito Kanahashi, Kosuke Nagashio. Nature Communications 17 [1] 602. 2026.https://doi.org/10.1038/s41467-026-68320-8 Open Access Springer Science and Business Media LLC (Publisher) Materials Data Repository (MDR) NIMS author(s)SAKUMA, YoshikiHIROTO, TakanobuNARA, JunOHTAKE, AkihiroFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Self-aligned and self-limiting van der Waals epitaxy of monolayer MoS2 for scalable 2D electronics Created at: 2026-01-28 03:07:15 +0900 Updated at: 2026-10-08 09:15:55 +0900
