HOME > Article > DetailEffect of plasma-cracked sulfur on the growth of tin-sulfide thin films by molecular beam depositionRyo Matsumura, Naoki Fukata. Japanese Journal of Applied Physics 64 [8] 08SP05. 2025.https://doi.org/10.35848/1347-4065/adf3be Open Access Materials Data Repository (MDR) NIMS author(s)MATSUMURA, RyoFUKATA, NaokiFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Effect of plasma-cracked sulfur on the growth of tin-sulfide thin films by molecular beam deposition Created at: 2025-08-19 03:09:34 +0900 Updated at: 2026-10-01 06:27:31 +0900