HOME > 論文 > 書誌詳細Effect of plasma-cracked sulfur on the growth of tin-sulfide thin films by molecular beam depositionRyo Matsumura, Naoki Fukata. Japanese Journal of Applied Physics 64 [8] 08SP05. 2025.https://doi.org/10.35848/1347-4065/adf3be Open Access Materials Data Repository (MDR) NIMS著者松村 亮深田 直樹Materials Data Repository (MDR)上の本文・データセットMDRavailable Effect of plasma-cracked sulfur on the growth of tin-sulfide thin films by molecular beam deposition 作成時刻: 2025-08-19 03:09:34 +0900 更新時刻: 2026-10-01 06:27:31 +0900
