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著者名Frank Volmer, Manfred Ersfeld, Lars Rathmann, Maximilian Heithoff, Luca Kotewitz, Mark Lohmann, Bowen Yang, Kenji Watanabe, Takashi Taniguchi, Ludwig Bartels, Jing Shi, Christoph Stampfer, Bernd Beschoten.
タイトルHow Photoinduced Gate Screening and Leakage Currents Dynamically Change the Fermi Level in 2D Materials
掲載誌名physica status solidi (RRL) – Rapid Research Letters 14 [10] 2000298
ISSN: 18626254
ESIでのカテゴリ: PHYSICS
出版社Wiley
発表年2020
言語English
DOIhttps://doi.org/10.1002/pssr.202000298
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