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How Photoinduced Gate Screening and Leakage Currents Dynamically Change the Fermi Level in 2D Materials

Frank Volmer, Manfred Ersfeld, Lars Rathmann, Maximilian Heithoff, Luca Kotewitz, Mark Lohmann, Bowen Yang, Kenji Watanabe, Takashi Taniguchi, Ludwig Bartels, Jing Shi, Christoph Stampfer, Bernd Beschoten.
Open Access Wiley (Publisher)

NIMS著者


Materials Data Repository (MDR)上の本文・データセット


    作成時刻 :2020-10-20 03:00:17 +0900 更新時刻 :2021-09-28 22:22:39 +0900

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