How Photoinduced Gate Screening and Leakage Currents Dynamically Change the Fermi Level in 2D Materials

Frank Volmer; Manfred Ersfeld; Lars Rathmann; Maximilian Heithoff; Luca Kotewitz; Mark Lohmann; Bowen Yang; Kenji Watanabe; Takashi Taniguchi; Ludwig Bartels; Jing Shi; Christoph Stampfer; Bernd Beschoten; Frank Volmer; Manfred Ersfeld; Lars Rathmann; Maximilian Heithoff; Luca Kotewitz; Mark Lohmann; Bowen Yang; Kenji Watanabe; Takashi Taniguchi; Ludwig Bartels; Jing Shi; Christoph Stampfer; Bernd Beschoten

doi:10.1002/pssr.202000298

How Photoinduced Gate Screening and Leakage Currents Dynamically Change the Fermi Level in 2D Materials

Frank Volmer, Manfred Ersfeld, Lars Rathmann, Maximilian Heithoff, Luca Kotewitz, Mark Lohmann, Bowen Yang, Kenji Watanabe, Takashi Taniguchi, Ludwig Bartels, Jing Shi, Christoph Stampfer, Bernd Beschoten.

physica status solidi (RRL) – Rapid Research Letters 14 [10] 2000298. 2020.

https://doi.org/10.1002/pssr.202000298

Open Access Wiley (Publisher)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2020-10-20 03:00:17 +0900Updated at: 2024-03-31 00:38:40 +0900