HOME > Article > DetailRole of Nitrogen Atoms in Reduction of Electron Charge Traps in Hf-Based High-k DielectricsN. Umezawa, K. Shiraishi, K. Torii, M. Boero, T. Chikyow, H. Watanabe, K. Yamabe, T. Ohno, K. Yamada, Y. Nara. IEEE Electron Device Letters 28 [5] 363-365. 2007.https://doi.org/10.1109/led.2007.894655 NIMS author(s)CHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 15:13:29 +0900Updated at: 2024-04-01 23:31:44 +0900