All About the Interface: Do Residual Contaminants at A High‐Quality h‐BN Monolayer Perylene Diimide Interface Cause Charge Trapping?
(All about the interface: Do residual contaminants at a high-quality h-BN monolayer perylene diimide interface cause charge trapping?)
著者 | Lukas Renn, Lisa S. Walter, WATANABE, Kenji, TANIGUCHI, Takashi, R. Thomas Weitz, Lukas Renn, Lisa S. Walter, R. Thomas Weitz. |
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掲載誌名 | Advanced Materials Interfaces 9 [10] 2101701 ISSN: 21967350 ESIでのカテゴリ: MATERIALS SCIENCE |
出版社 | Wiley |
発表年 | 2022 |
言語 | English |
DOI | https://doi.org/10.1002/admi.202101701 |
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