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All About the Interface: Do Residual Contaminants at A High‐Quality h‐BN Monolayer Perylene Diimide Interface Cause Charge Trapping?
(All about the interface: Do residual contaminants at a high-quality h-BN monolayer perylene diimide interface cause charge trapping?)

著者Lukas Renn, Lisa S. Walter, Kenji Watanabe, Takashi Taniguchi, R. Thomas Weitz.
掲載誌名Advanced Materials Interfaces 9 [10] 2101701
ISSN: 21967350
ESIでのカテゴリ: MATERIALS SCIENCE
出版社Wiley
発表年2022
言語English
DOIhttps://doi.org/10.1002/admi.202101701
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