All About the Interface: Do Residual Contaminants at A High‐Quality h‐BN Monolayer Perylene Diimide Interface Cause Charge Trapping?
(All about the interface: Do residual contaminants at a high-quality h-BN monolayer perylene diimide interface cause charge trapping?)

著者	Lukas Renn, Lisa S. Walter, Kenji Watanabe, Takashi Taniguchi, R. Thomas Weitz.
掲載誌名	Advanced Materials Interfaces 9 [10] 2101701 ISSN: 21967350 ESIでのカテゴリ: MATERIALS SCIENCE
出版社	Wiley
発表年	2022
言語	English
DOI	https://doi.org/10.1002/admi.202101701
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All About the Interface: Do Residual Contaminants at A High‐Quality h‐BN Monolayer Perylene Diimide Interface Cause Charge Trapping?(All about the interface: Do residual contaminants at a high-quality h-BN monolayer perylene diimide interface cause charge trapping?)