Bias-voltage application in a hard X-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Bias-voltage application in a hard X-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces

YAMASHITA, Yoshiyuki, CHIKYOW, Toyohiro, Keisuke Kobayashi.

SPring-8 Research Frontiers 2013 2013 54-55. 2014.

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作成時刻: 2016-05-24 17:24:15 +0900更新時刻: 2018-12-14 22:57:08 +0900

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