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Effects of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputtering

Kota Tatejima, Takahiro Nagata, Keiji Ishibashi, Kenichiro Takahashi, Setsu Suzuki, Atsushi Ogura, Toyohiro Chikyow.
Japanese Journal of Applied Physics 58 [SD] SDDG07. 2019.
https://doi.org/10.7567/1347-4065/ab088f

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