HOME > 論文 > 書誌詳細Effects of substrate self-bias and nitrogen flow rate on non-polar AlN film growth by reactive sputteringKota Tatejima, Takahiro Nagata, Keiji Ishibashi, Kenichiro Takahashi, Setsu Suzuki, Atsushi Ogura, Toyohiro Chikyow. Japanese Journal of Applied Physics 58 [SD] SDDG07. 2019.https://doi.org/10.7567/1347-4065/ab088f NIMS著者長田 貴弘知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2019-11-29 03:10:22 +0900 更新時刻: 2026-10-07 04:43:44 +0900
