HOME > 論文 > 書誌詳細Near-vertical plasma-free HCl gas etching on (011) β-Ga2O3Takayoshi Oshima, Yuichi Oshima. Japanese Journal of Applied Physics 64 [1] 018003. 2025.https://doi.org/10.35848/1347-4065/ada706 NIMS著者大島 孝仁大島 祐一Materials Data Repository (MDR)上の本文・データセット作成時刻: 2025-02-23 03:11:19 +0900 更新時刻: 2025-04-26 04:39:44 +0900
