HOME > 論文 > 書誌詳細Near-vertical plasma-free HCl gas etching on (011) β-Ga2O3Takayoshi Oshima, Yuichi Oshima. Japanese Journal of Applied Physics 64 [1] 018003. 2025.https://doi.org/10.35848/1347-4065/ada706 Open Access IOP Publishing (Publisher) Materials Data Repository (MDR) NIMS著者大島 孝仁大島 祐一Materials Data Repository (MDR)上の本文・データセットMDRavailable Near-vertical plasma-free HCl gas etching on (011) β-Ga<sub>2</sub>O<sub>3</sub> 作成時刻: 2025-02-23 03:11:19 +0900 更新時刻: 2026-06-09 04:37:07 +0900
