Near-vertical plasma-free HCl gas etching on (011) β-Ga<sub>2</sub>O<sub>3</sub> | SAMURAI, NIMS Researchers Directory Service

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Near-vertical plasma-free HCl gas etching on (011) β-Ga₂O₃

Takayoshi Oshima, Yuichi Oshima.

Japanese Journal of Applied Physics 64 [1] 018003. 2025.

https://doi.org/10.35848/1347-4065/ada706

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MDRavailable Near-vertical plasma-free HCl gas etching on (011) β-Ga<sub>2</sub>O<sub>3</sub>

Created at: 2025-02-23 03:11:19 +0900 Updated at: 2026-10-13 04:37:45 +0900

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