HOME > Article > DetailNear-vertical plasma-free HCl gas etching on (011) β-Ga2O3Takayoshi Oshima, Yuichi Oshima. Japanese Journal of Applied Physics 64 [1] 018003. 2025.https://doi.org/10.35848/1347-4065/ada706 Open Access Materials Data Repository (MDR) NIMS author(s)OSHIMA, TakayoshiOSHIMA, YuichiFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Near-vertical plasma-free HCl gas etching on (011) β-Ga<sub>2</sub>O<sub>3</sub> Created at: 2025-02-23 03:11:19 +0900 Updated at: 2026-09-12 04:37:42 +0900
