HOME > 論文 > 書誌詳細Impact of Cation Surface Termination on the Electrical Characteristics of HfO2/InGaAs(100) MOS CapacitorsAkihiro Ohtake, Noriyuki Miyata, Yuji Urabe, Tetsuji Yasuda. Japanese Journal of Applied Physics 50 [10] 10PD01. 2011.https://doi.org/10.1143/jjap.50.10pd01 NIMS著者大竹 晃浩Materials Data Repository (MDR)上の本文・データセット作成時刻: 2018-06-08 21:12:30 +0900 更新時刻: 2026-10-03 05:51:12 +0900
