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Impact of Cation Surface Termination on the Electrical Characteristics of HfO2/InGaAs(100) MOS Capacitors

Akihiro Ohtake, Noriyuki Miyata, Yuji Urabe, Tetsuji Yasuda.

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Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2018-06-08 21:12:30 +0900Updated at: 2024-04-01 23:22:47 +0900

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