HOME > Article > DetailImpact of Cation Surface Termination on the Electrical Characteristics of HfO2/InGaAs(100) MOS CapacitorsAkihiro Ohtake, Noriyuki Miyata, Yuji Urabe, Tetsuji Yasuda. Japanese Journal of Applied Physics 50 [10] 10PD01. 2011.https://doi.org/10.1143/jjap.50.10pd01 NIMS author(s)OHTAKE, AkihiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2018-06-08 21:12:30 +0900Updated at: 2024-04-01 23:22:47 +0900