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Silicon-doped indium oxide – a promising amorphous oxide semiconductor material for thin-film transistor fabricated by spin coating method

Ha Hoang, Kazutaka Sasaki, Tatsuki Hori, Kazuhito Tsukagoshi, Toshihide Nabatame, Bui Nguyen Quoc Trinh, Akihiko Fujiwara.
IOP Conference Series: Materials Science and Engineering 625 012002. 2019.
https://doi.org/10.1088/1757-899x/625/1/012002
Open Access IOP Publishing (Publisher)

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    作成時刻: 2019-10-19 03:01:14 +0900更新時刻: 2024-03-30 23:56:37 +0900

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