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Silicon-doped indium oxide – a promising amorphous oxide semiconductor material for thin-film transistor fabricated by spin coating method

著者Ha Hoang, Kazutaka Sasaki, Tatsuki Hori, Kazuhito Tsukagoshi, Toshihide Nabatame, Bui Nguyen Quoc Trinh, Akihiko Fujiwara.
掲載誌名IOP Conference Series: Materials Science and Engineering 625 012002
ISSN: 1757899X
出版社IOP Publishing
発表年2019
言語English
DOIhttps://doi.org/10.1088/1757-899x/625/1/012002
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