SAMURAI - NIMS Researchers Database

HOME > 論文 > 書誌詳細

Silicon-doped indium oxide – a promising amorphous oxide semiconductor material for thin-film transistor fabricated by spin coating method

Ha Hoang, Kazutaka Sasaki, Tatsuki Hori, Kazuhito Tsukagoshi, Toshihide Nabatame, Bui Nguyen Quoc Trinh, Akihiko Fujiwara.
Open Access IOP Publishing (Publisher)

NIMS著者


Materials Data Repository (MDR)上の本文・データセット


    作成時刻: 2019-10-19 03:01:14 +0900更新時刻: 2024-11-07 04:46:56 +0900

    ▲ページトップへ移動