HOME > 論文 > 書誌詳細Silicon-doped indium oxide – a promising amorphous oxide semiconductor material for thin-film transistor fabricated by spin coating methodHa Hoang, Kazutaka Sasaki, Tatsuki Hori, Kazuhito Tsukagoshi, Toshihide Nabatame, Bui Nguyen Quoc Trinh, Akihiko Fujiwara. IOP Conference Series: Materials Science and Engineering 625 012002. 2019.https://doi.org/10.1088/1757-899x/625/1/012002 Open Access IOP Publishing (Publisher) NIMS著者塚越 一仁生田目 俊秀Materials Data Repository (MDR)上の本文・データセット作成時刻: 2019-10-19 03:01:14 +0900更新時刻: 2024-11-07 04:46:56 +0900